THERMAL PROCESSING – Furnaces, Elements, Quartz
THEORIS 302 / FLOURIS 201 Vertical Oxidation Furnace THEORIS 302 / FLOURIS 201 Vertical Oxidation Furnace for 200mm and 300mm. Applicable process Dry ox, Wet ox, DCE ox, Silicon oxynitride ox, & Anneal.
THEORIS 302 / FLOURIS 201 Vertical Low Pressure Chemical Vapor Deposition System.
Applicable process - Silicon nitride, silicon dioxide film dep, poly, amorphous silicon
HORIS D8572A horizontal furnace -diffusion / oxidation system. Applicable process Atmospheric pressure (micro-positive pressure) closed-tube dry ox, wet ox, hydrogen -oxygen synthesis oxidation, annealing / Propulsion, alloy.
HORIS L6371 Multifunction Horizontal LPCVD. Applicable process:
Silicon dioxide ( LTO , TEOS ), silicon nitride ( Si 3 N 4 (including low stress)), polycrystalline silicon ( LP-POLY ), phosphorous silicon glass ( BSG ), borophosphosilicate glass (BPSG) , doped polysilicon, Graphene, carbon nanotubes and other thin film.
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DS Fibertech Corporation offers direct replacements of diffusion heater elements from OEMs, such as: Tokyo Electron (TEL), Hitachi Kokusai, Axcelis, Thermco, Bruce (BTI),Silicon Valley Group (SVG)
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